CNMG431ESEW-AC810P — Cross-Reference

Our equivalent: Sumitomo 3G-OTH-258175

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Also known as:CNMG431ESEW-AC810PSUMITOMO

Cross-reference match for “CNMG431ESEW-AC810P”

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SUMITOMO

SUMITOMO CNMG431ESEW-AC810P Diamond Indexable Turning Insert

SKU: 3G-OTH-258175

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CNMG431ESEW-AC810P — Cross-Reference

Cross-reference match for “CNMG431ESEW-AC810P”

SUMITOMO CNMG431ESEW-AC810P Diamond Indexable Turning Insert

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Sumitomo Diamond indexable turning insert for precision machining of non-ferrous materials. Suitable for turning operations on aluminum alloys and composites, providing high wear resistance and surface finish. Designations include DNMG434EEM and DNMG150416N-EM.

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Sumitomo Diamond indexable turning insert for precision finishing of non-ferrous materials such as aluminum alloys and composites. Suitable for industrial turning operations requiring high surface finish and extended tool life.

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Sumitomo Diamond-shaped indexable turning insert for general turning operations. Designed for use in machining centers and lathes to achieve efficient cutting and chip control. Suitable for a range of materials in typical metalworking applications.

Sumitomo Diamond indexable turning insert for precision turning operations on hard materials. Features specific geometries for chip control and cutting performance. Suitable for general machining applications requiring tight tolerances.

Sumitomo Diamond indexable turning insert for precision machining of non-ferrous materials, composites, and abrasive plastics. Used in turning, boring, and facing operations. Identified as DNMG434EEM and DNMG150416N-EM.

Sumitomo Diamond indexable turning insert for precision machining of non-ferrous materials, plastics, and composites. Suitable for turning, boring, and profiling operations requiring fine surface finishes. Manufacturer part number CCMT21.51ESU-AC5015S.

Sumitomo Diamond indexable turning insert for precision machining of non-ferrous materials. Suitable for turning operations on aluminum alloys and composites. Offers high hardness and thermal conductivity for demanding applications.